%0 Journal Article
%@holdercode {isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S}
%@nexthigherunit 8JMKD3MGPCW/3ESR3H2
%@archivingpolicy denypublisher denyfinaldraft24
%@usergroup administrator
%@usergroup banon
%@usergroup simone
%3 two step.pdf
%B Vacuum
%X This paper reports the results of a two-step hot filament chemical vapor deposition method to improve the quality of diamond films. Diamond films were deposited on a Si(100) substrate having an area of 45 cm(2) and a thickness of 60 mu m. employing a HFCVD system. The first step is the growth of CVD diamond in the HFCVD reactor. In the second step, the samples were treated in a saturated solution of H2SO4:CrO3 and rinsed in a (1:1) solution of H2O2: NH4OH. After this procedure, a second diamond layer was deposited. The diamond films were analyzed by raman scattering spectroscopy (RSS). scanning electron microscopy (SEM), and X-ray photoelectron spectroscopy (XPS). The films showed a high degree of purity with a thickness of 60 mu m, presenting uniform characteristics over a large area.
%@mirrorrepository sid.inpe.br/mtc-m18@80/2008/03.17.15.17.24
%8 Mar.
%N 7
%T Two-step growth of HFCVD diamond films over large areas
%@secondarytype PRE PI
%K HFCVD, Diamond, Two-step growth, Large area.
%@group
%@group
%@group LAS-CTE-INPE-MCT-BR
%@group LAS-CTE-INPE-MCT-BR
%@secondarykey INPE--PRE/
%@issn 0042-207X
%2 sid.inpe.br/mtc-m18@80/2009/07.02.19.28.09
%@affiliation
%@affiliation
%@affiliation Instituto Nacional de Pesquisas Espaciais (INPE)
%@affiliation Instituto Nacional de Pesquisas Espaciais (INPE)
%P 1054-1056
%4 sid.inpe.br/mtc-m18@80/2009/07.02.19.28
%D 2009
%V 89
%@doi 10.1016/j.vacuum.2008.11.013
%A Amorim, A.,
%A Nascente, P. A. P.,
%A Trava-Airoldi,  Vladimir Jesus,
%A Corat, Evaldo José,
%A Alves, A. R.,
%A Moro, J. R.,
%@dissemination WEBSCI; PORTALCAPES; COMPENDEX.
%@area FISMAT