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1. Identificação
Tipo de ReferênciaArtigo em Evento (Conference Proceedings)
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Sitemtc-m16c.sid.inpe.br (namespace prefix: upn:32NSFRP)
Identificador8JMKD3MGP8W/364B3PL
Repositóriosid.inpe.br/mtc-m18@80/2009/09.18.16.51
Última Atualização2009:09.18.16.51.59 (UTC) administrator
Repositório de Metadadossid.inpe.br/mtc-m18@80/2009/09.18.16.52.01
Última Atualização dos Metadados2020:04.28.17.49.04 (UTC) administrator
Chave SecundáriaINPE--PRE/
Chave de CitaçãoVieiraNonoOliv:2009:AFXPAn
TítuloAFM and XPS analyses of magnetron sputtered TiN functional films on AISI M2 and AISI D6 steel substrates
Ano2009
Data de Acesso01 set. 2026
Tipo SecundárioPRE CI
Número de Arquivos1
Tamanho31 KiB
2. Contextualização
Autor1 Vieira, Rogério de Almeida
2 Nono, Maria do Carmo Andrade
3 Oliveira, Ivo C.
Grupo1
2 LAS-CTE-INPE-MCT-BR
Afiliação1 Departamento de Tecnologia Industrial, Universidade do Estado de Santa Catarina
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Departamento de Física, Instituto de Tecnologia Aeronáutica
Endereço de e-Mail do Autor1 ravieira@sbs.udesc.br
2 marian@las.inpe.br
3 ivo@ita.br
Nome do EventoInternational Conference on Advanced Materials.
Localização do EventoRio de Janeiro, RJ
Data20-25 Sept.
Tipo TerciárioOral Session
Acervo Hospedeirosid.inpe.br/mtc-m18@80/2008/03.17.15.17 upn:32NSFRP
Histórico (UTC)2009-09-18 16:52:02 :: simone -> administrator ::
2020-04-28 17:49:04 :: administrator -> simone :: 2009
3. Conteúdo e estrutura
É a matriz ou uma cópia?é a matriz
Estágio do Conteúdoconcluido
Transferível1
Tipo do ConteúdoExternal Contribution
ResumoThe current technological applications of materials, mainly metals covered with nitride films are vast. However, now a lot of investigations exist with the objective of more and more to optimize the adherence of these films in steels substrate seeking to enlarge its application fields. The nitride films based on metallic cations, as titanium, zirconium, chrome and aluminum, have demonstrated to be interesting in applications where are necessary high surface hardness, corrosion and fracture resistance. However, the adherence of these films has been the main limitation for the tribological applications that demand high mechanic resistance. In this work it was proposed the study of techniques of interface dilution of film/substrate: i) diffusion or interdifusion provoked by temperature and ii) gradual variation of the chemical composition of the interface film-substrate (functional films). In this work, the TiN functional films depositions on AISI M2 and AISI D6 were accomplished. These functional films were obtained through magnetron sputtering. The main objective was creating diluted interfaces that they are areas where the properties of the film and substrate vary in a gradual way. These interfaces formed areas of tensions absorption generated by the functional film deposited. The morphology surface and chemical compounds of the films were characterized by atomic force microscopy (AFM) and X ray photoelectron spectroscopy (XPS). These results showed a good deposition with nanometre and homogeneous nucleus of the nitride titanium functional film deposited in AISI M2 and AISI D6 steels substrate.
ÁreaFISMAT
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Conteúdo da Pasta docacessar
Conteúdo da Pasta sourcenão têm arquivos
Conteúdo da Pasta agreementnão têm arquivos
4. Condições de acesso e uso
URI dos dadosupn:32NSFRP:8JMKD3MGP8W/364B3PL
URL dos dadoshttp://urlib.net/ibi/8JMKD3MGP8W/364B3PL
URL dos dados zipadoshttp://urlib.net/zip/8JMKD3MGP8W/364B3PL
Arquivo AlvoR519.pdf
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5. Fontes relacionadas
Repositório Espelhosid.inpe.br/mtc-m18@80/2008/03.17.15.17.24
Unidades Imediatamente Superiores8JMKD3MGPCW/3ESR3H2
Lista de Itens Citandosid.inpe.br/bibdigital/2013/09.24.19.30 - 17
sid.inpe.br/bibdigital@80/2006/04.07.15.50.13 - 5
6. Notas
Campos Vaziosarchivingpolicy archivist booktitle callnumber copyholder copyright creatorhistory descriptionlevel dissemination documentstage doi e-mailaddress edition editor format isbn issn keywords label language lineage mark nextedition notes numberofvolumes orcid organization pages parameterlist parentrepositories previousedition previouslowerunit progress project publisher publisheraddress readergroup readpermission resumeid rightsholder schedulinginformation secondarydate secondarymark serieseditor session shorttitle sponsor subject tertiarymark type url versiontype volume
7. Controle da descrição
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