Fechar
Metadados

@PhDThesis{Vieira:2005:EsMoSu,
               author = "Vieira, Rog{\'e}rio de Almeida",
                title = "Estudo das modifica{\c{c}}{\~o}es de superf{\'{\i}}cies de 
                         a{\c{c}}os ferramenta e a{\c{c}}os r{\'a}pido com filmes 
                         funcionais e aderentes de TiN e de AIN obtidos via 
                         deposi{\c{c}}{\~a}o reativa por PVD",
               school = "Instituto Nacional de Pesquisas Espaciais (INPE)",
                 year = "2005",
              address = "S{\~a}o Jos{\'e} dos Campos",
                month = "2005-08-16",
             keywords = "interfaces, filmes finos, nitreto de tit{\^a}nio, nitreto de 
                         alum{\'{\i}}nio, difus{\~a}o, interfaces, thin films, titanium 
                         nitride, aluminum nitride, diffusion.",
             abstract = "As aplica{\c{c}}{\~o}es tecnol{\'o}gicas atuais de materiais 
                         s{\~a}o vastas, principalmente metais revestidos com filmes de 
                         nitretos. Nos {\'u}ltimos anos, muitas investiga{\c{c}}{\~o}es 
                         tem sido realizadas com o objetivo de otimizar a ader{\^e}ncia 
                         destes filmes em substratos de a{\c{c}}os visando ampliar o seu 
                         campo de aplica{\c{c}}{\~o}es. Os filmes de nitretos compostos 
                         de c{\'a}tions met{\'a}licos, especialmente de tit{\^a}nio, 
                         zirc{\^o}nio, cromo e alum{\'{\i}}nio, t{\^e}m demonstrado ser 
                         de grande interesse em aplica{\c{c}}{\~o}es onde s{\~a}o 
                         necess{\'a}rias durezas superficiais, resist{\^e}ncias {\`a} 
                         corros{\~a}o e ao cisalhamento altos. Entretanto, a 
                         ader{\^e}ncia destes filmes tem sido a principal 
                         limita{\c{c}}{\~a}o para as aplica{\c{c}}{\~o}es 
                         tribol{\'o}gicas que exigem grande esfor{\c{c}}o mec{\^a}nico 
                         superficial. Neste projeto foi proposto o estudo de t{\'e}cnicas 
                         de dilui{\c{c}}{\~a}o da interface filme/substrato por: i) 
                         difus{\~a}o ou interdifus{\~a}o provocadas termicamente ativadas 
                         e ii) varia{\c{c}}{\~a}o gradativa da composi{\c{c}}{\~a}o 
                         qu{\'{\i}}mica da interface filme-substrato (filmes funcionais). 
                         Foram estudados os filmes e as interfaces formados entre os filmes 
                         de TiN e AlN e os substratos de a{\c{c}}os AISI M2 e AISI D6 
                         (VC131). Na primeira etapa, foram produzidos dois tipos de filmes: 
                         de nitreto de tit{\^a}nio e de nitreto de alum{\'{\i}}nio. Os 
                         filmes de nitreto de tit{\^a}nio foram obtidos via 
                         deposi{\c{c}}{\~a}o de TiN por arco cat{\'o}dico. Os filmes de 
                         nitreto de alum{\'{\i}}nio foram obtidos por PVD 
                         (deposi{\c{c}}{\~a}o f{\'{\i}}sica de fase vapor) pelo uso de 
                         magnetron sputtering. Estes filmes foram caracterizados por: 
                         difra{\c{c}}{\~a}o de raios X (DRX), microscopia eletr{\^o}nica 
                         de varredura por el{\'e}trons secund{\'a}rios e por 
                         el{\'e}trons retroespalhados (MEV), espectrometria por energia 
                         dispersiva de raios X (EDX), microscopia por for{\c{c}}a 
                         at{\^o}mica (atomic force microscopy - AFM), por espectroscopia 
                         de retroespalhamento Rutherford (Rutherford backscattering - RBS) 
                         e ensaios por flex{\~a}o em 4 pontos. Os resultados mostraram uma 
                         {\'o}tima ader{\^e}ncia do filme de nitreto de tit{\^a}nio e 
                         p{\'e}ssima ader{\^e}ncia do filme de nitreto de 
                         alum{\'{\i}}nio depositados em substratos de a{\c{c}}os M2 e 
                         D6. Na segunda etapa, foram realizadas as deposi{\c{c}}{\~o}es 
                         de filmes funcionais de nitreto de tit{\^a}nio e de nitreto de 
                         alum{\'{\i}}nio. Estes filmes funcionais foram obtidos usando 
                         deposi{\c{c}}{\~a}o por magnetron sputtering. O objetivo 
                         principal deste projeto foi de obter interfaces dilu{\'{\i}}das, 
                         que s{\~a}o regi{\~o}es onde as propriedades do filme e do 
                         substrato variam de forma gradativa. Estas interfaces formaram 
                         regi{\~o}es de absor{\c{c}}{\~a}o das tens{\~o}es 
                         mec{\^a}nicas geradas pela intera{\c{c}}{\~a}o entre o filme 
                         funcional depositado e o substrato. Todos os filmes foram 
                         caracterizados por difra{\c{c}}{\~a}o de raios X (DRX), 
                         microscopia eletr{\^o}nica de varredura por el{\'e}trons 
                         secund{\'a}rios e secund{\'a}rios e por el{\'e}trons 
                         retroespalhados (MEV), espectrometria por energia dispersiva de 
                         raios X (EDX), espectroscopia de fotoel{\'e}trons por raios X 
                         (photoelectron spectroscopy - XPS), microscopia por for{\c{c}}a 
                         at{\^o}mica (AFM), espectroscopia de retroespalhamento Rutherford 
                         (Rutherford backscattering - RBS), e ensaios por flex{\~a}o em 4 
                         pontos. Os resultados mostraram uma {\'o}tima ader{\^e}ncia do 
                         filme funcional de nitreto de tit{\^a}nio e p{\'e}ssima 
                         ader{\^e}ncia do filme funcional de nitreto de alum{\'{\i}}nio 
                         depositados em substratos de a{\c{c}}os M2 e D6. Os susbstratos 
                         de a{\c{c}}o r{\'a}pido M2 apresentaram melhores resultados de 
                         crescimento de filmes e de ader{\^e}ncia. ABSTRACT: The current 
                         technological applications of materials, mainly metals covered 
                         with nitride films are vast. In the last years, a lot of 
                         investigations have been made with the objective to optimize the 
                         adherence of these films in steels substrate seeking to enlarge 
                         its application fields. The nitride films based on metallic 
                         cations, as titanium, zirconium, chrome and aluminum, have 
                         demonstrated to be interesting for applications where are 
                         necessary higher surface hardness, corrosion and fracture 
                         resistance. However, the adherence of these films has been the 
                         main limitation for the tribological applications that demand high 
                         mechanic resistance. In this research it was proposed the study of 
                         techniques of interface dilution of film/substrate: i) diffusion 
                         or interdifusion provoked by temperature and ii) gradual variation 
                         of the chemical composition of the interface film-substrate 
                         (functional films). It was studied the films and interfaces formed 
                         between the TiN and AlN films and AISI M2 and AISI D6 (VC131) 
                         steel substrates. In the first stage, two types of films were 
                         produced: titanium nitride and aluminum nitride. The titanium 
                         nitride films were obtained by arc cathodic. The aluminum nitride 
                         films were obtained by magnetron sputtering. These films were 
                         characterized by X-rays diffraction (XRD), scanning electron 
                         microscope by secondary and backscattering electrons (SEM), energy 
                         dispersive spectrometry (EDS), atomic force microscopy (AFM) 
                         Rutherford backscattering (RBS), and bending test accomplished in 
                         4 points. The results showed a excellent adherence of the titanium 
                         nitride film and poor adherence of the aluminum nitride film on M2 
                         and D6 steel substrates. In the second stage, the functional films 
                         depositions of titanium nitride and aluminum nitride were 
                         accomplished. These functional films were obtained through 
                         magnetron sputtering. The main objective of this project was 
                         creating of diluted interfaces which are areas where the 
                         properties of the film and substrate vary in a gradual way. These 
                         interfaces formed areas of mechanical tensions absorption 
                         generated by the deposited functional film. All the films were 
                         characterized by X-rays diffraction (XRD), scanning electron 
                         microscope (SEM), energy dispersive spectrometry (EDS), X-rays 
                         photoelectron spectroscopy (XPS), atomic force microscopy (AFM), 
                         Rutherford backscattering (RBS), and bending test accomplished in 
                         4 points. These results showed a great adherence of the nitride 
                         titanium functional film and little adherence of the nitride 
                         aluminum functional film deposited in M2 and D6 steel substrates. 
                         The M2 speed steel substrate presented a better growth and 
                         adherence.",
            committee = "An, Chen Ying (presidente) and Nono, Maria do Carmo de Andrade 
                         (orientadora) and Cairo, Carlos Alberto Alves and Nunes, Carlos 
                         Angelo and Moura Neto, Carlos de",
           copyholder = "SID/SCD",
         englishtitle = "Surface modification study of took and high speed steel with 
                         functional and adherent TiN and ain films obtained by PVD reactive 
                         deposition",
             language = "pt",
                pages = "209",
                  ibi = "6qtX3pFwXQZGivnJSY/HTbxm",
                  url = "http://urlib.net/rep/6qtX3pFwXQZGivnJSY/HTbxm",
           targetfile = "publicacao.pdf",
        urlaccessdate = "06 dez. 2019"
}


Fechar